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タイトル
  • en Effect of Substrate Bias on Production and Transport of Etchant Ions in a Magnetic Neutral Loop Discharge Plasma
作成者
アクセス権 open access
権利情報
  • en © 2014 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.
主題
  • Other en Bias
  • Other en etchant
  • Other en Monte Carlo method
  • Other en NLD plasma
  • Other en quadrupole magnetic field
  • Other en separatrix
  • NDC 427
内容注記
  • Abstract en Production and transport of etchant ions in an RF (13.56 MHz) magnetic neutral loop (NL) discharge plasma in the presence and the absence of an ac (1.695 MHz) substrate bias were simulated using a Monte Carlo method. Under the bias, electrons accelerated near the NL were attracted to the substrate and produced more etchant ions near the substrate than in the absence of the bias. Effect of bias leading to enhancement of the ion inflow to the substrate was discussed.
出版者 en IEEE
日付
    Issued2014-10-21
言語
  • eng
資源タイプ journal article
出版タイプ AM
資源識別子 HDL http://hdl.handle.net/2115/57754
関連
  • isVersionOf DOI https://doi.org/10.1109/TPS.2014.2337753
収録誌情報
    • PISSN 0093-3813
      • en IEEE Transactions on Plasma Science
      • 巻42 号10 開始ページ2540 終了ページ2541
ファイル
コンテンツ更新日時 2023-07-26