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タイトル
  • en Communication-Anisotropic Electrochemical Etching of Porous Gallium Nitride by Sub-Bandgap Absorption Due to Franz-Keldysh Effect
作成者
    • en Toguchi, Masachika
    • en Miwa, Kazuki
アクセス権 metadata only access
権利情報
主題
  • Other en Etching - Electrochemical
  • Other en electrochemical etching
  • Other en gallium nitride
  • Other en sub-bandgap absorption
  • NDC 540
内容注記
  • Abstract en Anisotropic electrochemical etching of porous GaN structures by utilizing charge carriers generated by sub-bandgap absorption has been developed. Sub-bandgap light with a photon energy below the bandgap energy was transmitted through bulk GaN, but a certain type of photo-absorption additively occurred at the pore tip due to the Franz-Keldysh effect. The photocurrents observed when the reverse bias was applied to n-GaN were well reproduced by calculation taking into account the Frantz-Keldysh effect. The pore diameter was not changed that much, but the pore depth could be successfully controlled by the intensity and irradiation time of the sub-bandgap light. (C) The Author(s) 2019. Published by ECS.
出版者 en The Electrochemical Society (ECS)
日付
    Issued2019-07-15
言語
  • eng
資源タイプ journal article
出版タイプ NA
資源識別子 HDL http://hdl.handle.net/2115/75274
関連
  • isIdenticalTo DOI https://doi.org/10.1149/2.0551912jes
収録誌情報
    • PISSN 0013-4651
    • NCID AA00697016
      • en Journal of the electrochemical society
      • 166 12 開始ページH510 終了ページH512
コンテンツ更新日時 2023-07-26