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Title
  • en Development of an experimental system for cell viability assays of yeasts using gas-temperature controllable plasma jets
Creator
    • en YOSHIMURA, Shinji
    • en OTSUBO, Yoko
    • en YAMASHITA, Akira
    • en JOHZUKA, Katsuki
    • en TSUTSUMI, Takayoshi
    • en ISHIKAWA, Kenji
    • en HORI, Masaru
Rights
  • en This is the Accepted Manuscript version of an article accepted for publication in Japanese Journal of Applied Physics. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at https://doi.org/10.35848/1347-4065/acd4ca.
Description
  • Other 0000-0002-0602-0665
  • Abstract en The characteristics of a gas-temperature-controllable atmospheric-pressure helium plasma jet and the development of an experimental system for cell viability assays of yeasts (fission yeast Schizosaccharomyces pombe and budding yeast Saccharomyces cerevisiae) are reported. The physicochemical properties of the plasma plume, which can maintain the temperature of the irradiated object at a temperature suitable for yeast, were not significantly different from those of a typical helium plasma jet. Furthermore, good reproducibility of cell viability was observed when gas temperature, gas flow rate, applied high voltage, and irradiation distance remained fixed, and only irradiation time was used as a parameter. This experimental system allows us to carry out various experiments, such as the search for plasma-resistant mutants that will contribute to the identification of genes involved in resistance to direct plasma irradiation.
Publisher en IOP Publishing
Date
    Issued2023-06-08
Language
  • eng
Resource Type journal article
Version Type AM
Identifier HDL http://hdl.handle.net/10655/0002000011 , URI https://nifs-repository.repo.nii.ac.jp/records/2000011
Relation
  • isVersionOf DOI https://doi.org/10.35848/1347-4065/acd4ca
  • en Shinji Yoshimura et al 2023 Jpn. J. Appl. Phys. 62 SL1011
  • isVersionOf DOI https://doi.org/10.35848/1347-4065/acd4ca Publisher version
Journal
    • NCID AA12295836
    • ISSN 0021-4922
      • en Japanese Journal of Applied Physics
      • Volume Number62 Issue NumberSL Page Start1011
File
Oaidate 2023-08-19